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Extract specific mask tile based on layout and index for segmented image manipulation and analysis.
The ETN_ExtractMaskTile node is designed to extract a specific tile from a given mask based on a predefined tile layout and an index. This node is particularly useful when working with segmented or tiled images, allowing you to isolate and manipulate individual sections of a mask. By providing a mask, a tile layout, and an index, the node efficiently slices the mask into the desired tile, making it easier to focus on specific areas for further processing or analysis. This functionality is essential for tasks that require precise control over different regions of an image, such as image editing, object detection, or region-specific transformations.
The mask
parameter represents the input mask from which a specific tile will be extracted. This mask is typically a binary or grayscale image where different regions are marked for various purposes. The mask should be provided in a format that the node can process, ensuring that it aligns with the expected dimensions and data type.
The layout
parameter defines the tile layout used to segment the mask. This layout specifies how the mask is divided into smaller tiles, which is crucial for accurately extracting the desired section. The layout must be compatible with the mask and should be predefined to ensure consistency in the extraction process.
The index
parameter indicates the specific tile to be extracted from the mask. It is an integer value with a minimum of 0, representing the position of the tile within the layout. The index allows you to target a particular tile, making it possible to isolate and work on specific regions of the mask.
The output mask
parameter is the extracted tile from the input mask. This tile corresponds to the section of the mask specified by the layout and index parameters. The extracted mask tile retains the same properties as the original mask but is limited to the defined region, making it easier to apply localized operations or analyses.
mask
and layout
parameters are correctly aligned to avoid mismatches during the extraction process.index
parameter to systematically extract and process different tiles from the mask, enabling detailed and localized manipulations.© Copyright 2024 RunComfy. All Rights Reserved.