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Manipulate mask images with offsets, rotations, duplication, and edge wrapping for precise control in AI art projects.
The OffsetMask node is designed to manipulate and transform mask images by applying various offsets and rotations. This node allows you to shift the mask horizontally and vertically, rotate it by a specified angle, and duplicate the mask multiple times to create a batch. Additionally, it offers options for edge wrapping and different padding modes, making it a versatile tool for adjusting masks in your AI art projects. By using this node, you can achieve precise control over the positioning and orientation of your masks, which can be particularly useful for complex compositions and effects.
The input mask or mask batch that you want to transform. This parameter is essential as it serves as the base image for all subsequent transformations.
The horizontal offset to apply to the mask. This value can range from -4096 to the maximum resolution, with a default of 0. Positive values shift the mask to the right, while negative values shift it to the left.
The vertical offset to apply to the mask. This value can range from -4096 to the maximum resolution, with a default of 0. Positive values shift the mask downward, while negative values shift it upward.
The angle in degrees to rotate the mask. This value can range from -360 to 360 degrees, with a default of 0. Positive values rotate the mask clockwise, while negative values rotate it counterclockwise.
The number of times to duplicate the mask to form a batch. This value can range from 1 to 1000, with a default of 1. Increasing this value creates multiple copies of the mask, which can be useful for batch processing.
A boolean parameter that determines whether to apply edge wrapping when the mask is shifted. The default value is False. When set to True, the mask edges will wrap around, creating a continuous effect.
A boolean parameter that determines whether to apply incremental offsets. The default value is False. When set to True, the offsets will be applied incrementally, which can create a cascading effect.
The padding mode to use when the mask is shifted. Options include 'empty', 'border', and 'reflection', with 'empty' as the default. This parameter determines how the empty spaces created by the shift are filled.
The transformed mask or mask batch. This output reflects all the applied offsets, rotations, and duplications, providing you with the final adjusted mask.
duplication_factor
to create multiple copies of a mask for batch processing, which can save time and ensure consistency across multiple images.padding_mode
to achieve different visual effects when shifting the mask. For example, 'reflection' can create a mirrored edge, while 'empty' will leave the edges transparent.incremental
parameter to create dynamic, cascading effects by applying offsets incrementally.© Copyright 2024 RunComfy. All Rights Reserved.