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InvertMask node reverses mask values to switch highlighted and suppressed regions, aiding image processing and AI art creation.
The InvertMask node is designed to invert the values of a given mask, effectively transforming areas of high intensity to low intensity and vice versa. This operation is particularly useful in image processing and AI art creation, where you might need to reverse the areas of interest or focus within a mask. By inverting the mask, you can easily switch the regions that are highlighted or suppressed, providing greater flexibility and control over your artistic and computational processes. This node simplifies the task of mask inversion, making it accessible even to those without a deep technical background.
The mask
parameter is the primary input for the InvertMask node. It represents the mask that you want to invert. The mask is typically a grayscale image where different intensity values indicate different levels of importance or focus. The inversion process will transform each pixel value v
in the mask to `1.0
The output parameter MASK
is the result of the inversion process. It is a new mask where each pixel value has been inverted from the original mask. This means that areas that were previously highlighted (with higher values) will now be suppressed (with lower values), and vice versa. The output mask can then be used in subsequent image processing or AI art creation steps to achieve the desired effects.
mask
parameter is not supplied to the InvertMask node.© Copyright 2024 RunComfy. All Rights Reserved.