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InvertMask node reverses masked areas to unmasked and vice versa, aiding in image segmentation tasks for AI artists.
The InvertMask node is designed to invert a given mask, effectively transforming all the masked areas into unmasked areas and vice versa. This operation is particularly useful in image processing and segmentation tasks where you need to reverse the regions of interest. By inverting the mask, you can easily switch the focus from the foreground to the background or highlight different parts of an image. This node simplifies the process of mask manipulation, making it a valuable tool for AI artists who work with complex image segmentation tasks.
The mask
parameter is the input mask that you want to invert. A mask is typically a binary or grayscale image where certain areas are marked to indicate regions of interest. In this context, the mask is expected to be a tensor where pixel values represent the masked (foreground) and unmasked (background) areas. The inversion process will flip these values, turning masked areas into unmasked ones and vice versa. This parameter does not have specific minimum, maximum, or default values as it directly depends on the input mask provided.
The output parameter MASK
is the inverted version of the input mask. This output will have the same dimensions as the input mask but with the pixel values inverted. For instance, if the input mask had a pixel value of 1 (indicating a masked area), the output mask will have a pixel value of 0 at the same position, and vice versa. This inverted mask can then be used in subsequent image processing or segmentation tasks to focus on different regions of the image.
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