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Apply masks to segmented images with bitwise AND operation for precise image processing control.
The ImpactSegsAndMaskForEach
node is designed to apply a series of masks to a set of segmented images, performing a bitwise AND operation on each pair of segment and mask. This node is particularly useful for AI artists who need to refine or filter their segmented images based on specific mask criteria. By applying individual masks to each segment, you can achieve more precise and controlled results in your image processing tasks. This node automates the process of masking each segment, ensuring consistency and efficiency in your workflow.
This parameter represents the segmented images that you want to process. Each segment typically includes a cropped image, a mask, and additional metadata such as confidence scores and bounding boxes. The segs
parameter is crucial as it provides the base data on which the masks will be applied. There are no specific minimum, maximum, or default values for this parameter, but it should be a valid set of segmented images.
This parameter consists of the masks that will be applied to each segment in the segs
parameter. Each mask should correspond to a segment, and the bitwise AND operation will be performed between each segment's mask and the provided mask. The masks
parameter is essential for defining the areas of interest or exclusion within each segment. Similar to segs
, there are no specific minimum, maximum, or default values, but the masks should be valid and correctly aligned with the segments.
The output parameter SEGS
represents the segmented images after the bitwise AND operation has been applied to each segment with its corresponding mask. This output retains the original structure of the segments but with updated masks that reflect the bitwise AND operation. The resulting segments can be used for further processing or analysis, providing a refined set of segmented images based on the applied masks.
[SegsBitwiseAndMask] Cannot operate: MASK is empty.
masks
parameter contains valid masks and that they are correctly aligned with the segments.Mismatch between number of segments and masks
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